Compound Mutagenesis on Near-isogenic Lines TcLr10 by 60Co γRay and EMS in Wheat

doi:10.7668/hbnxb.2008.S2.020

Abstract

Abstract: ⁶⁰Co γ ray and EMS were used to treat wheat leaf rust resistance gene lineTcLr10 in order to establish the compound mutagenesis system for wheat near iso??genetic line.The germination rate, trefoil stage, fatal rate and disease re??sistance after treatment were investigated.The result showed that the effect of germination rate was not significant affectedby the treatment of⁶⁰Co γ ray and EMS at different dosage.The wheat was nearly reach trefoil stage at the same time inevery mutagenesis dose.However, the time required from trefoil stage to quatrefoil stage was decreased with the concentra??tion increase.The fatal rate remarkably increased when the irradiationdose was or over 0. 15 kGy. Three mutants of near??isogenic lines TcLr10 in wheat were obtained when the concentration of EMS was 0. 4% and the irradiation dose of ⁶⁰Co ray was 0.15 kGy.The effect of compound mutagenesis on Tclr10 was the best when the irradiation dose was 0. 15 kGyand the concentration of EMS was 0. 4%.

Key words: Wheat leaf rust, Near??isogenic lines, Compound mutagenesis, EMS

CLC Number:

S435.121.4+3

CHENG Zhi-feng, YANG Wen-xiang, LIU Da-qun. Compound Mutagenesis on Near-isogenic Lines TcLr10 by ⁶⁰Co γRay and EMS in Wheat[J]. ACTA AGRICULTURAE BOREALI-SINICA, 2008, 23(S2): 92-95. doi: 10.7668/hbnxb.2008.S2.020.

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