ACTA AGRICULTURAE BOREALI-SINICA ›› 2005, Vol. 20 ›› Issue (2): 80-83. doi: 10.3321/j.issn:1000-7091.2005.02.021

Special Issue: Wheat

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Study on Damage Effects of Wheat Seedling after Ion Implantation

WANG Wei-dong, WEN Jie, SU Ming-jie, QIN Guang-yong, HUO Yu-ping   

  1. Henan Provincial Key Laboratory of Ion Beam Bioengineering, Zhengzhou University, Zhengzhou 450052, China
  • Received:2004-09-20 Published:2005-04-28

Abstract: Embryos of wheat varieties Jian 54, Yunong 118 and Yumai 18 were implanted by different dose rate and fluence at the energy of 30 keV. The result showed that with the increase of dose rate and fluence wheat seedling's damage was increased. Wheat seedling's height became lower and the first leaf shorter with the dose change. The difference of wheat seedling height and the first leaf were significant with the increase of the dose rate. The effects of ion implantation to varieties were different. In addition, there were some variations in wheat seedings after implantation. They embodied in chlorophyll defect in leaf nervation and morphological aberrance of plants. At last the right dose rate and dose was induced on wheat mutation by ion beam implantation.

Key words: Ion implantation, Dose rate, Fluence, Seedling damage, Variation

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Cite this article

WANG Wei-dong, WEN Jie, SU Ming-jie, QIN Guang-yong, HUO Yu-ping. Study on Damage Effects of Wheat Seedling after Ion Implantation[J]. ACTA AGRICULTURAE BOREALI-SINICA, 2005, 20(2): 80-83. doi: 10.3321/j.issn:1000-7091.2005.02.021.

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