华北农学报 ›› 2005, Vol. 20 ›› Issue (2): 80-83. doi: 10.3321/j.issn:1000-7091.2005.02.021

所属专题: 小麦

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低能离子注入后小麦苗期损伤效应研究

王卫东, 闻捷, 苏明杰, 秦广雍, 霍裕平   

  1. 郑州大学离子束生物工程省重点实验室, 河南, 郑州, 450052
  • 收稿日期:2004-09-20 出版日期:2005-04-28
  • 作者简介:王卫东(1977-),男,河南正阳人,博士,主要从事离子注入农作物后的生物效应研究.
  • 基金资助:
    国家"十五"科技攻关项目(2001BA302B-03)

Study on Damage Effects of Wheat Seedling after Ion Implantation

WANG Wei-dong, WEN Jie, SU Ming-jie, QIN Guang-yong, HUO Yu-ping   

  1. Henan Provincial Key Laboratory of Ion Beam Bioengineering, Zhengzhou University, Zhengzhou 450052, China
  • Received:2004-09-20 Published:2005-04-28

摘要: 以鉴5、豫农118及豫麦18号为材料, 研究了不同剂量率、剂量离子注入对小麦幼苗生长的影响.结果表明, 随着剂量率和剂量的增加小麦幼苗损伤程度逐渐加剧, 具体表现在苗高降低、第一叶长变短.剂量率间差异显著, 品种间有辐射敏感性差异.另外苗期还发现了一些变异, 主要表现为主叶脉失绿和形态畸形.离子束诱变的合适剂量在6×1017ions/cm2以上.

关键词: 离子注入, 剂量率, 剂量, 苗期损伤, 变异

Abstract: Embryos of wheat varieties Jian 54, Yunong 118 and Yumai 18 were implanted by different dose rate and fluence at the energy of 30 keV. The result showed that with the increase of dose rate and fluence wheat seedling's damage was increased. Wheat seedling's height became lower and the first leaf shorter with the dose change. The difference of wheat seedling height and the first leaf were significant with the increase of the dose rate. The effects of ion implantation to varieties were different. In addition, there were some variations in wheat seedings after implantation. They embodied in chlorophyll defect in leaf nervation and morphological aberrance of plants. At last the right dose rate and dose was induced on wheat mutation by ion beam implantation.

Key words: Ion implantation, Dose rate, Fluence, Seedling damage, Variation

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引用本文

王卫东, 闻捷, 苏明杰, 秦广雍, 霍裕平. 低能离子注入后小麦苗期损伤效应研究[J]. 华北农学报, 2005, 20(2): 80-83. doi: 10.3321/j.issn:1000-7091.2005.02.021.

WANG Wei-dong, WEN Jie, SU Ming-jie, QIN Guang-yong, HUO Yu-ping. Study on Damage Effects of Wheat Seedling after Ion Implantation[J]. ACTA AGRICULTURAE BOREALI-SINICA, 2005, 20(2): 80-83. doi: 10.3321/j.issn:1000-7091.2005.02.021.

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