华北农学报 ›› 2005, Vol. 20 ›› Issue (1): 31-34. doi: 10.3321/j.issn:1000-7091.2005.01.007

所属专题: 小麦

• 论文 • 上一篇    下一篇

离子注入对小麦苗期性状的诱变效应研究

闻捷1, 李淑萍2, 崔党群3, 秦广雍1, 霍裕平1   

  1. 1. 郑州大学, 离子束生物工程重点实验室, 河南, 郑州, 450052;
    2. 商丘师范学院, 生物系, 河南, 商丘, 476000;
    3. 河南农业大学, 河南, 郑州, 450002
  • 收稿日期:2004-11-01 出版日期:2005-02-28
  • 作者简介:闻捷(1978-),女,河南项城人,在读博士,主要从事离子注入农作物后的生物效应方面的研究工作。
  • 基金资助:
    国家"十五"科技攻关项目(2001BA302B-03)

Studies on Mutation Effects on Young Wheat Plant Characters Implanted with Ion Beam

WEN Jie1, LI Shu-ping2, CUI Dang-qun3, QIN Guang-yong1, HUO Yu-ping1   

  1. 1. Ionbeam Bioengineering Labority of Zhengzhou University, Zhengzhou 450052, China;
    2. Biology Department Shangqiu Teachers College, Shangqiu 476000, China;
    3. Henan Agriculture University, Zhengzhou 450002, China
  • Received:2004-11-01 Published:2005-02-28

摘要: 为了研究离子注入剂量对小麦苗期性状的影响,用7种不同剂量的低能N+离子分别注入3个小麦品种 (系)的干种子,进行发芽试验和盆栽试验。结果表明:离子注入对种子发芽存在品种特异性,在本试验条件下发芽率剂量间差异不显著,发芽势随剂量增大而下降。离子注入对苗高、第一叶长和初生根的影响在剂量间差异均达极显著水平;对次生根的影响存在品种特异性。离子注入后比未经离子注入时表现苗高、第一叶长降低,而初生根和次生根增多的现象;各剂量对苗高、第一叶长、初生根和次生根4个苗期性状影响趋势相同,均随着剂量的增大而呈先降后升再降的趋势。

关键词: 离子注入, 小麦, 苗期性状, 诱变效应

Abstract: In order to study Nitrogen ion beam mutation effects on young wheat plant characters, discuss and find its' principles, air-dried seeds of each variety(line) Yumai 52,Yumai 2 and Yunong 92349 were lm- planted by Nitrogen Ion Beam, at mutation dose of 1 × 1017-6 × 1017N+/cm2.Non-treated seeds were control. Germination test and potted plant test were carried out,both germination rate potential and its rate,and young wheat plant characters, which are seedling height,first leaf length,number of seminal roots and number of second-class roots were researched. The results showed that:1.The effects of Ion implantation on variety germination are different. That is, the difference of germination rate isn't significant,however, along with the increase of dosage, germination potential decrease. 2.To young wheat plant characters, after ion beam implantation,seedling height and first leaf length were decreased,number of seminal roots and number of second-class roots were increased;at the same time, with the increase of dosage, the tendency of ion implant effects is same: first decrease,then increase, and decrease. Moreover, there is variety difference to dose variance in second-class semfinal roots, in addition to this character, the dose variance in other three characters is significant.

Key words: Key words, Ion Beam implantation, Wheat, Young plant characters, Mutation effects

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引用本文

闻捷, 李淑萍, 崔党群, 秦广雍, 霍裕平. 离子注入对小麦苗期性状的诱变效应研究[J]. 华北农学报, 2005, 20(1): 31-34. doi: 10.3321/j.issn:1000-7091.2005.01.007.

WEN Jie, LI Shu-ping, CUI Dang-qun, QIN Guang-yong, HUO Yu-ping. Studies on Mutation Effects on Young Wheat Plant Characters Implanted with Ion Beam[J]. ACTA AGRICULTURAE BOREALI-SINICA, 2005, 20(1): 31-34. doi: 10.3321/j.issn:1000-7091.2005.01.007.

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