华北农学报 ›› 2000, Vol. 15 ›› Issue (2): 72-77. doi: 10.3321/j.issn:1000-7091.2000.02.016

所属专题: 小麦

• 论文 • 上一篇    下一篇

中外小麦品种光温互作效应比较研究

尹钧, 曹卫星   

  1. 南京农业大学, 江苏南京 210095
  • 收稿日期:1999-10-20 出版日期:2000-03-28
  • 基金资助:
    山西省留学回国人员基金项目

Study on Combined Effects of Vernalization and Photoperiod on Wheat Varieties at Home and Abroad

YIN Jun, CAO Weixing   

  1. Nanjing Agricultural University, Nanjing 210095, China
  • Received:1999-10-20 Published:2000-03-28

摘要: 来源不同的参试冬小麦品种(春小麦品种)具有对春化(日长)反应敏感性远大于对日长(春化)反应的一般特征。但英国冬小麦兼有中国超强冬性品种的短日效应和冬性品种的春化累积量;美国冬性品种则兼有中国强冬性品种的春化累积量和冬性品种的长日反应特性。英、澳春性小麦对春化作用也有微弱反应,类似中国南方冬播春性小麦。中国中熟冬麦区温光条件与英美品种温光特性的差异是引种生育期较长、成熟偏晚的主要原因。

关键词: 小麦, 中外品种, 苗穗期, 穗分化, 温光互作

Abstract: The winter (spring) wheat varieties selected in the experimenthave a characteristic of larger sensitivity to vernalizat ion (photoperiod) than to photoperiod (vernalization). The winter wheat from UKhas not only short photoperiod response similar to super strong winterness (SSW) variety, but also a vernalization accumulative quantity (VAQ) similar to winterness (W) variety. VAQ of winter wheat from USA is similar to st rong winterness (SW) variety, but its response to photoperiod is similar to w interness (W) variety. The spring varieties from UK and Australiahave a weak vernalization similar to the spring varieties from southern China. The difference between natural vernalization and photoperiod condition and the development characteristic of the varieties from UK and USA results in the longer grow ing period and late maturing in winter wheat zone of China.

Key words: Wheat, Varieties at home and abroad, Seedling??heading period, Spike differentiation, Combined effects of vernalization and photoperiod

中图分类号: 

引用本文

尹钧, 曹卫星. 中外小麦品种光温互作效应比较研究[J]. 华北农学报, 2000, 15(2): 72-77. doi: 10.3321/j.issn:1000-7091.2000.02.016.

YIN Jun, CAO Weixing. Study on Combined Effects of Vernalization and Photoperiod on Wheat Varieties at Home and Abroad[J]. ACTA AGRICULTURAE BOREALI-SINICA, 2000, 15(2): 72-77. doi: 10.3321/j.issn:1000-7091.2000.02.016.

使用本文